Materials and Processes for Next Generation Lithography

Nonfiction, Science & Nature, Science, Chemistry, Physical & Theoretical, Technology, Material Science
Cover of the book Materials and Processes for Next Generation Lithography by Alex Robinson, Richard Lawson, Elsevier Science
View on Amazon View on AbeBooks View on Kobo View on B.Depository View on eBay View on Walmart
Author: Alex Robinson, Richard Lawson ISBN: 9780081003589
Publisher: Elsevier Science Publication: November 8, 2016
Imprint: Elsevier Language: English
Author: Alex Robinson, Richard Lawson
ISBN: 9780081003589
Publisher: Elsevier Science
Publication: November 8, 2016
Imprint: Elsevier
Language: English

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.

  • Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation
  • Includes information on processing and metrology techniques
  • Brings together multiple approaches to litho pattern recording from academia and industry in one place
View on Amazon View on AbeBooks View on Kobo View on B.Depository View on eBay View on Walmart

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.

More books from Elsevier Science

Cover of the book Introduction to Emergency Management by Alex Robinson, Richard Lawson
Cover of the book Modern Engineering Thermodynamics - Textbook with Tables Booklet by Alex Robinson, Richard Lawson
Cover of the book Low-Cost Carriers in Emerging Countries by Alex Robinson, Richard Lawson
Cover of the book Handbook of the Economics of Education by Alex Robinson, Richard Lawson
Cover of the book Visibility by Alex Robinson, Richard Lawson
Cover of the book Advances in Experimental Social Psychology by Alex Robinson, Richard Lawson
Cover of the book Mathematical Modeling in Diffraction Theory by Alex Robinson, Richard Lawson
Cover of the book Catecholamine Research in the 21st Century by Alex Robinson, Richard Lawson
Cover of the book Field Guide to Appropriate Technology by Alex Robinson, Richard Lawson
Cover of the book Bio-nanoimaging by Alex Robinson, Richard Lawson
Cover of the book Chemokines by Alex Robinson, Richard Lawson
Cover of the book Clean Coal Engineering Technology by Alex Robinson, Richard Lawson
Cover of the book Electromagnetics Explained by Alex Robinson, Richard Lawson
Cover of the book Sexually Transmitted Diseases by Alex Robinson, Richard Lawson
Cover of the book Human Facial Expression by Alex Robinson, Richard Lawson
We use our own "cookies" and third party cookies to improve services and to see statistical information. By using this website, you agree to our Privacy Policy