Through-Silicon Vias for 3D Integration

Nonfiction, Science & Nature, Technology, Nanotechnology, Electronics, Circuits, Telecommunications

• Author: John H. Lau
• ISBN: 9780071785150
• Publisher: McGraw-Hill Education
• Publication: August 5, 2012
• Imprint: McGraw-Hill Education
• Language: English

A comprehensive guide to TSV and other enabling technologies for 3D integration

Written by an expert with more than 30 years of experience in the electronics industry, Through-Silicon Vias for 3D Integration provides cutting-edge information on TSV, wafer thinning, thin-wafer handling, microbumping and assembly, and thermal management technologies. Applications to highperformance, high-density, low-power-consumption, wide-bandwidth, and small-form-factor electronic products are discussed.

This book offers a timely summary of progress in all aspects of this fascinating field for professionals active in 3D integration research and development, those who wish to master 3D integration problem-solving methods, and anyone in need of a low-power, wide-bandwidth design and high-yield manufacturing process for interconnect systems.

Coverage includes:

• Nanotechnology and 3D integration for the semiconductor industry
• TSV etching, dielectric-, barrier-, and seed-layer deposition, Cu plating, CMP, and Cu revealing
• TSVs: mechanical, thermal, and electrical behaviors
• Thin-wafer strength measurement
• Wafer thinning and thin-wafer handling
• Microbumping, assembly, and reliability
• Microbump electromigration
• Transient liquid-phase bonding: C2C, C2W, and W2W
• 2.5D IC integration with interposers
• 3D IC integration with interposers
• Thermal management of 3D IC integration
• 3D IC packaging