X-Ray Scattering from Semiconductors and Other Materials

Nonfiction, Science & Nature, Science, Physics, Solid State Physics, Technology, Material Science
Cover of the book X-Ray Scattering from Semiconductors and Other Materials by Paul F Fewster, World Scientific Publishing Company
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Author: Paul F Fewster ISBN: 9789814436946
Publisher: World Scientific Publishing Company Publication: February 12, 2015
Imprint: WSPC Language: English
Author: Paul F Fewster
ISBN: 9789814436946
Publisher: World Scientific Publishing Company
Publication: February 12, 2015
Imprint: WSPC
Language: English

This third edition has been extended considerably to incorporate more information on instrument influences on the interpretation of X-ray scattering profiles and reciprocal space maps. Another significant inclusion is on the scattering from powder samples, covering a new theoretical approach that explains features that conventional theory cannot. The new edition includes some of the latest methodologies and theoretical treatments, including the latest thinking on dynamical theory and diffuse scattering. Recent advances in detectors also present new opportunities for rapid data collection and some very different approaches in data collection techniques; the possibilities associated with these advances will be included.

This edition should be of interest to those who use X-ray scattering to understand more about their samples, so that they can make a better judgment of the parameter and confidence levels in their analyses, and how the combination of instrument, sample and detection should be considered as a whole to ensure this.

Contents:

  • An Introduction to Semiconductor Materials
  • The Theory of X-ray Scattering
  • Components for Measuring Scattering Patterns
  • Instruments for Measuring Scattering Patterns
  • A Practical Guide to the Estimation of structural Parameters and Interpretation of Scattering Patterns

Readership: Students and professionals in semiconductors research and related areas (materials science, condensed matter).

View on Amazon View on AbeBooks View on Kobo View on B.Depository View on eBay View on Walmart

This third edition has been extended considerably to incorporate more information on instrument influences on the interpretation of X-ray scattering profiles and reciprocal space maps. Another significant inclusion is on the scattering from powder samples, covering a new theoretical approach that explains features that conventional theory cannot. The new edition includes some of the latest methodologies and theoretical treatments, including the latest thinking on dynamical theory and diffuse scattering. Recent advances in detectors also present new opportunities for rapid data collection and some very different approaches in data collection techniques; the possibilities associated with these advances will be included.

This edition should be of interest to those who use X-ray scattering to understand more about their samples, so that they can make a better judgment of the parameter and confidence levels in their analyses, and how the combination of instrument, sample and detection should be considered as a whole to ensure this.

Contents:

Readership: Students and professionals in semiconductors research and related areas (materials science, condensed matter).

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