Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

Nonfiction, Science & Nature, Technology, Material Science
Cover of the book Atomic Layer Deposition by David Cameron, Arthur Sherman, Tommi Kääriäinen, Marja-Leena Kääriäinen, Wiley
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Author: David Cameron, Arthur Sherman, Tommi Kääriäinen, Marja-Leena Kääriäinen ISBN: 9781118747384
Publisher: Wiley Publication: May 17, 2013
Imprint: Wiley-Scrivener Language: English
Author: David Cameron, Arthur Sherman, Tommi Kääriäinen, Marja-Leena Kääriäinen
ISBN: 9781118747384
Publisher: Wiley
Publication: May 17, 2013
Imprint: Wiley-Scrivener
Language: English

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

View on Amazon View on AbeBooks View on Kobo View on B.Depository View on eBay View on Walmart

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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