Atomic Layer Deposition
Principles, Characteristics, and Nanotechnology Applications
Nonfiction, Science & Nature, Technology, Material Science
| Author: | David Cameron, Arthur Sherman, Tommi Kääriäinen, Marja-Leena Kääriäinen | ISBN: | 9781118747384 |
| Publisher: | Wiley | Publication: | May 17, 2013 |
| Imprint: | Wiley-Scrivener | Language: | English |
| Author: | David Cameron, Arthur Sherman, Tommi Kääriäinen, Marja-Leena Kääriäinen |
| ISBN: | 9781118747384 |
| Publisher: | Wiley |
| Publication: | May 17, 2013 |
| Imprint: | Wiley-Scrivener |
| Language: | English |
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
