Arthur Sherman: 1 book
Atomic Layer Deposition
Principles, Characteristics, and Nanotechnology Applications
Language: English
Release Date: May 17, 2013
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers...
