Design for Manufacturability with Advanced Lithography

Nonfiction, Science & Nature, Technology, Electronics, Circuits, Computers, Advanced Computing, Engineering, Computer Architecture
Cover of the book Design for Manufacturability with Advanced Lithography by Bei Yu, David Z. Pan, Springer International Publishing
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Author: Bei Yu, David Z. Pan ISBN: 9783319203850
Publisher: Springer International Publishing Publication: October 28, 2015
Imprint: Springer Language: English
Author: Bei Yu, David Z. Pan
ISBN: 9783319203850
Publisher: Springer International Publishing
Publication: October 28, 2015
Imprint: Springer
Language: English

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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